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| Brand | MVSystems |
|---|---|
| Origin | USA |
| Manufacturer Type | Authorized Distributor |
| Import Status | Imported |
| Model | MVS-Sputter |
| Target Material Options | Single or Multi-Target Configuration |
| Target Diameter | Standard 2-inch (50.8 mm) or Custom (e.g., 3-inch, 4-inch) |
| Control Interface | Manual Knob + Analog Metering or Optional Digital PID Controller with RS-232/USB Output |
| Chamber Dimensions (W×D×H) | 180 × 180 × 220 mm (7.1 × 7.1 × 8.7 in) |
| Sample Stage Diameter | 100 mm (3.9 in), Adjustable Height & Tilt |
| Sputtering Gas Compatibility | Argon (Ar), Gold (Au), Platinum (Pt), Palladium (Pd), Chromium (Cr), Iridium (Ir), and Reactive Gases (e.g., O₂, N₂) for Oxide/Nitride Coating |
| Base Pressure | ≤5 × 10⁻⁶ Torr (achieved via dual-stage vacuum system: rotary vane pump + turbomolecular pump) |
| Deposition Uniformity | ±5% across 100 mm substrate (measured by quartz crystal microbalance and profilometry) |
| Film Thickness Control | Real-time monitoring via integrated quartz crystal thickness monitor (QCM), resolution: 0.1 Å |
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