Coating Machine
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| Brand | 4IR |
|---|---|
| Origin | Shanghai, China |
| Manufacturer Type | Authorized Distributor |
| Country of Origin | China |
| Model | CPT-230 |
| Price Range | USD 14,000 – 42,500 |
| Brand | Abner |
|---|---|
| Origin | Jiangsu, China |
| Manufacturer Type | Authorized Distributor |
| Country of Origin | China |
| Model | ABN-500-Y1 |
| Vacuum Base Pressure | ≤4×10⁻⁵ Pa |
| Pump-Down Time | ≤30 min to 5×10⁻⁴ Pa |
| Thickness Uniformity | ±3% (max deviation ±5%) |
| Thickness Control Accuracy | ±5% |
| Deposition Rate | Up to 5 nm/s (material- and source-dependent) |
| Process Duration Range | 0–30 min |
| Cooling | Water-cooled electrodes and chamber flanges |
| Safety Interlocks | Vacuum, overcurrent, and cooling water flow monitoring |
| Brand | Abner |
|---|---|
| Origin | Jiangsu, China |
| Manufacturer Type | Authorized Distributor |
| Country of Origin | China |
| Model | ABN-500-Y2 |
| Base Price | USD 67,000 (FOB Jiangsu) |
| Operating Pressure Range | 5×10⁻⁵ Pa – 5×10⁻³ Pa |
| Gas Inlets | 2 independent MFC-controlled channels |
| Substrate Heating | RT to 300 °C |
| Max DC/RF Current | 0.1–100 A |
| RF Power Stability | ≤5% |
| Target Diameter | 6 inch |
| Uniformity | ±3% over Ø100 mm substrate |
| Compatible Power Modes | DC, RF, Pulsed DC |
| Brand | Abner |
|---|---|
| Origin | Jiangsu, China |
| Manufacturer Type | Authorized Distributor |
| Product Origin | Domestic (China) |
| Model | EI Series |
| Pricing | Available Upon Request |
| Brand | AdNaNo |
|---|---|
| Origin | USA |
| Model | Customized-5 |
| Maximum Substrate Size | 8-inch |
| Vacuum System | High-vacuum compatible (customizable base pressure ≤ 5×10⁻⁷ Torr) |
| Evaporation Sources | Dual resistive-heating crucibles (compatible with metals & organics) |
| Control Options | Manual and fully automated PLC-based operation |
| Substrate Heating | Integrated temperature-controlled stage (up to 300 °C, ±1 °C stability) |
| Compliance | Designed for ISO 14644-1 Class 5 cleanroom integration |
| Software Interface | RS-485/Modbus-enabled for SCADA or LabVIEW integration |
| Brand | AdNaNo |
|---|---|
| Origin | USA |
| Manufacturer Type | Authorized Distributor |
| Import Status | Imported |
| Model | Customized-6 |
| Vacuum Chamber Dimensions | Custom |
| Base Pressure | ≤6.0 × 10⁻⁵ Pa |
| Evaporation Sources | 6 × 40 cm³ Crucibles |
| Substrate Heating Capability | Up to 300 °C |
| Intra-Wafer Thickness Uniformity | ≤ ±3% |
| Substrate Holder Configurations | Arch-type and Planetary-type Rotating Fixtures |
| Control System | Fully Automated Process Sequencing |
| Sample Size & Quantity | Fully Customizable |
| Brand | AGUS |
|---|---|
| Origin | Japan |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | SSP-1000 |
| Price Range | USD 110,000 – 138,000 |
| Maximum Substrate Diameter | φ100 mm |
| Thickness Uniformity | ±5% over φ100 mm area |
| RF Power Mode | Pulsed RF (13.56 MHz) |
| Gas Inlets | Standard 1, Optional 2 |
| Sputtering Orientation | Upward, Lateral, Downward (reconfigurable cubic chamber) |
| Target Compatibility | Metallic, Oxide (e.g., Al₂O₃, SiO₂), Nitride, and Magnetic Targets (optional) |
| Substrate Holder | Rotatable or Fixed |
| Viewport | Integrated Quartz Observation Window |
| Cathode Shielding | Removable Cathode Protection Plate with Integrated Sputter Timer for Thickness Estimation |
| Brand | DENTON |
|---|---|
| Origin | USA |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | Desk V HP |
| Pricing | Available Upon Request |
| Brand | Denton Vacuum |
|---|---|
| Origin | USA |
| Model | Explorer |
| Substrate Size (Max) | 8" (200 mm) |
| Base Pressure | ≤5 × 10⁻⁶ Torr |
| Pumping Options | Turbo-molecular or Diffusion Pump |
| Deposition Methods | Thermal Evaporation, E-beam Evaporation, DC/Pulse DC/RF Sputtering, Co-sputtering, Ion Beam Assisted Deposition (IAD), PECVD |
| Load Lock Option | Available |
| Vacuum Architecture | High-vacuum, differential pumping compatible |
| Compliance | Designed for GLP/GMP-aligned labs |
| Brand | Diener |
|---|---|
| Origin | Germany |
| Model | P6 |
| Coating Types | Parylene N, C, D, F-VT4 |
| Coating Thickness Range | 0.05–20 µm |
| Chamber Dimensions (Ø × H) | 200 × 200 mm |
| Substrate Holder (Ø × H) | 170 × 170 mm |
| Pyrolyzer Power / Max Temp | 1.6 kW / 750 °C |
| Vacuum Pump | Dual-stage oil-sealed rotary vane pump |
| Pumping Speed | 16 m³/h |
| Base Pressure | ≤1 × 10⁻³ mbar |
| Control System | Integrated Windows-based PC |
| Electrical Supply | 230 V / 16 A / 50–60 Hz |
| Overall Dimensions (W × D × H) | 700 × 500 × 700 mm |
| Brand | DRETOP |
|---|---|
| Origin | Shanghai, China |
| Manufacturer Type | Direct Manufacturer |
| Region Category | Domestic (China) |
| Model | VAC-Flux90 |
| Price Range | USD 1,400 – 8,500 |
| Power Supply | AC 220 V, 50 Hz |
| Control System | PLC-based Intelligent Touchscreen Interface |
| Temperature Range | RT +10 °C to 200 °C |
| Temperature Resolution | 0.1 °C |
| Temperature Uniformity | ±0.1 °C |
| Ultimate Vacuum | ≤133 Pa |
| Chamber Dimensions (W×D×H) | 450 × 450 × 450 mm |
| Internal Volume | 90 L |
| Sample Capacity | Up to 4 standard wafer cassettes (e.g., 25–50 × 100 mm or 4 × 150 mm wafers) |
| Shelf Configuration | 2-tier stainless steel adjustable trays |
| Construction | 304 stainless steel interior and exterior |
| Viewing Window | Tempered glass with silicone gasket seal |
| HMDS Delivery | Closed-loop, nitrogen-carrier vaporized dosing system |
| Exhaust Handling | Integrated vacuum-pump–coupled exhaust line for HMDS-laden vapor to dedicated abatement or scrubber system |
| Brand | DRETOP |
|---|---|
| Origin | Shanghai, China |
| Manufacturer Type | Authorized Distributor |
| Country of Origin | China |
| Model | ZDM Series |
| Price Range | USD 7,000 – 16,800 |
| Vacuum Level | ≤133 Pa |
| Temperature Range | RT+10°C to 200°C |
| Temp. Resolution | 0.1°C |
| Temp. Uniformity | ±0.1°C |
| Chamber Volume | 90 L / 125 L / 210 L |
| Chamber Dimensions | 450×450×450 mm / 500×500×500 mm / 550×550×650 mm |
| Control System | PLC with Color Touchscreen HMI |
| Sample Capacity | Up to 4 wafer cassettes |
| Process Compatibility | Thermal Evaporation, Sputtering, PECVD, PLD, MBE |
| Compliance | RoHS, REACH |
| Brand | DRETOP |
|---|---|
| Origin | Shanghai, China |
| Manufacturer Type | Direct Manufacturer |
| Country of Origin | China |
| Model | ZDM-125V |
| Vacuum Level | ≤133 Pa |
| Chamber Dimensions | 500 × 500 × 500 mm |
| Internal Volume | 125 L |
| Temperature Range | RT+10°C to 200°C |
| Temperature Resolution | 0.1°C |
| Temperature Uniformity | ±0.1°C |
| Control System | PLC-based HMI with Color Touchscreen |
| Sample Capacity | Up to 4 wafer cassettes (standard 4-inch or 6-inch compatibility) |
| Chamber Material | Stainless Steel (304/316L grade) |
| Viewing Window | Tempered Glass with O-ring Sealed Access Door |
| Sealing | Integrated Silicone Rubber Gasket |
| Structural Design | Cuboidal Rigid Frame with Right-Angle Reinforcement |
| Compliance | RoHS, REACH, ISO 14644-1 Class 8 Cleanroom-Compatible Construction |
| Brand | DRETOP |
|---|---|
| Origin | Shanghai, China |
| Manufacturer Type | Direct Manufacturer |
| Country of Origin | China |
| Model | ZDM-215V |
| Price Range | USD 5,600 – 16,800 |
| Power Supply | AC 220 V, 50 Hz |
| Control System | PLC-based intelligent touchscreen interface |
| Temperature Range | RT +10 °C to 200 °C |
| Temperature Resolution | 0.1 °C |
| Temperature Uniformity | ±0.1 °C |
| Ultimate Vacuum | ≤133 Pa |
| Chamber Dimensions (W×D×H) | 550 × 550 × 650 mm |
| Internal Volume | 210 L |
| Sample Capacity | Up to 4 standard wafer cassettes (e.g., 4 × 25-wafer FOUPs or equivalent) |
| Chamber Material | 304 stainless steel interior |
| Viewing Window | Tempered glass with O-ring sealed viewport |
| Sealing | Integrated silicone rubber gasket |
| Process Compatibility | Thermal evaporation, magnetron sputtering, pulsed laser deposition (PLD), molecular beam epitaxy (MBE), and plasma-enhanced chemical vapor deposition (PECVD) modules (modular integration supported) |
| Exhaust Treatment | Integrated HMDS/organic solvent recovery system compliant with RoHS & REACH |
| Brand | Europlasma |
|---|---|
| Origin | Belgium |
| Model | CD 1000 |
| Coating Thickness | 50–500 nm (single-layer), 1–3 µm (multi-layer) |
| Waterproof Rating | IPX2–IPX8 |
| Cycle Time | 10–30 min (standard), 3–4 h (multi-layer) |
| Substrate Compatibility | Nonwovens, polymer films, meshes, nanofiber webs, PCBs, electronic assemblies, 3D components |
| Compliance | ISO 10993-5 (cytotoxicity), ISO 10993-10 (irritation/sensitization), halogen-free formulation |
| Operating Environment | Low-pressure plasma chamber, vacuum-based surface polymerization & atomic layer deposition (ALD)-compatible process |
| Origin | Liaoning, China |
|---|---|
| Manufacturer Type | Authorized Distributor |
| Origin Category | Domestic (China) |
| Model | Tri-Target High-Vacuum |
| Pricing | Upon Request |
| Ultimate Vacuum | ≤5.0×10⁻⁵ Pa (after bake-out) |
| Leak Rate | <2.0×10⁻⁸ Pa·L/s |
| Pump-Down Time to 6.0×10⁻⁴ Pa | ≤40 min (after brief air exposure + dry N₂ purge) |
| Chamber Dimensions | Ø300 × 350 mm |
| Target Diameter | Ø50 mm (3 targets |
| Substrate Heating Range | RT–600 °C ±1 °C |
| Substrate Rotation Speed | ≤30 rpm |
| Target-to-Substrate Distance | Adjustable from 90–110 mm |
| Base Pressure Recovery (12 h idle) | ≤5 Pa |
| Brand | Guangzhou Jingying |
|---|---|
| Origin | Guangdong, China |
| Manufacturer | Yes |
| Country of Origin | China |
| Model | JY-S100 |
| Vacuum Range | Atmosphere to 1×10⁻³ mbar |
| Ultimate Vacuum | ≤1×10⁻⁴ mbar |
| Sputtering Current | 5–30 mA (digital microprocessor-controlled) |
| Target Diameter | 57 mm × 0.1 mm thickness |
| Standard Sample Stage | 12-position SEM stub holder, height-adjustable (60 mm range) |
| Optional Rotating/Tilting Stage | 0–60 rpm, tilt angle −90° to +90° |
| Chamber | Stainless steel, Ø120 mm × H75 mm |
| Viewport | Ø120 mm × H45 mm |
| Base Rotation Stage | Ø40 mm (holds 4 standard stubs) |
| Vacuum Pump Speed | 133 L/min |
| Operating Noise Level | 56 dB(A) |
| Target Materials | Au (standard), optional Pt, Au/Pd, Pt/Pd |
| Brand | k-Space Associates |
|---|---|
| Model | kSA BandiT |
| Origin | USA |
| Type | Non-Contact, Absorption-Edge-Based In-Situ Temperature Monitoring System for Semiconductor Wafers |
| Temperature Range | RT to 750 °C (up to 1300 °C with optional configuration) |
| Repeatability | ±0.2 °C |
| Resolution | 0.1 °C |
| Stability | ±0.2 °C |
| Measurement Principle | Temperature-Dependent Bandgap Absorption Edge Shift (Tauc Plot Method) |
| Compatible Platforms | MBE, MOCVD, Sputtering, PLD, Evaporation, Annealing & Rapid Thermal Processing (RTP) Systems |
| Laser Wavelength Options | Visible (e.g., 405 nm, 635 nm) and Near-IR (e.g., 980 nm, 1310 nm) |
| Surface Analysis Capabilities | In-situ deposition rate, film thickness estimation, and surface roughness correlation |
| Optical Interface | Standard viewport-compatible |
| Software | kSA BandiT Multi-Wafer Mapping Suite with motorized XY scanning stage control |
| Brand | KJ GROUP |
|---|---|
| Origin | Liaoning, China |
| Manufacturer Type | Authorized Distributor |
| Country of Origin | China |
| Model | GSL-1100X-SPC-12 |
| Input Voltage | 208–240 V AC, 50/60 Hz |
| Sample Stage Diameter | Φ60 mm, height-adjustable |
| Chamber | Quartz tube, Φ100 mm × 130 mm |
| Gas Inlet | Integrated precision valve for controlled gas introduction (Ar, N₂, O₂, etc.) |
| Target Specifications | 4N purity Au target, Φ57 mm × 0.12 mm |
| Max. Sample Diameter | 40 mm |
| Max. Film Thickness | Up to 300 nm |
| Dimensions (W×D×H) | 480 × 320 × 150 mm |
| Weight | 20 kg |
| Brand | KJ GROUP |
|---|---|
| Origin | Liaoning, China |
| Model | GSL-1100X-SPC-16 |
| Vacuum Chamber | Ø160 mm × 120 mm |
| Sample Stage Diameter | Ø50 mm (adjustable height) |
| Max Uniform Coating Area | Ø45 mm |
| Coating Thickness Range | Up to 300 Å |
| Power Supply | AC 220 V, 50 Hz |
| Total Power Consumption | <2000 W (including vacuum pump) |
| Dimensions | 400 mm × 300 mm × 400 mm |
| Weight | 30 kg |
| Certified | CE |
| Brand | KJ GROUP |
|---|---|
| Origin | Liaoning, China |
| Model | GSL-1100X-SPC-16-3 |
| Vacuum Chamber | Ø160 mm × 120 mm |
| Target Diameter | Ø45 mm |
| Number of Targets | 3 |
| Max DC Voltage | 1600 V |
| Max DC Current | 50 mA |
| Ultimate Vacuum | ≤4 × 10⁻² mbar |
| Timer Range | 0–900 s |
| Base Pumping Speed | 2 L/s (mechanical pump) |
| Dimensions | 400 mm × 300 mm × 400 mm |
| Weight | 30 kg |
| Gas Compatibility | High-purity Ar (≥99.99%) |
| Electrical Supply | AC 220 V, 50 Hz, grounded |
| Brand | KJ GROUP |
|---|---|
| Origin | Liaoning, China |
| Model | GSL-1100X-SPC-16C |
| Vacuum Chamber | Ø160 mm × 110 mm |
| Sample Stage | Ø50 mm |
| Target Diameter | Ø50 mm |
| Base Pressure | 2×10⁻² mbar (with 4 L/s two-stage rotary pump) |
| Operating Pressure Range | 4×10⁻¹–2×10⁻² mbar |
| DC Sputtering Power Supply | 0–1600 V DC adjustable, up to 50 mA |
| Timer Range | 0–9999 s |
| Dimensions (L×W×H) | 400×310×390 mm |
| Weight | 50 kg |
| Argon Purity Requirement | ≥99.99% |
| Electrical Supply | AC 220 V, 50 Hz, grounded |
| Brand | KJ GROUP |
|---|---|
| Origin | Liaoning, China |
| Model | GSL-1100X-SPC-16M |
| Vacuum Chamber | Ø160 mm × 120 mm |
| Target Diameter | Ø50 mm |
| Base Pressure | ≤4×10⁻² mbar |
| Max Sputtering Current | 50 mA (optional 100 mA) |
| DC Bias Voltage | up to 1600 V DC |
| Process Gas | High-purity Argon (≥99.99%) |
| Cooling | Peltier-cooled sputter head & optional water-cooled stage |
| Dimensions (W×D×H) | 360 mm × 300 mm × 380 mm |
| Net Weight | 15 kg (system), 50 kg (total) |
| Brand | KJ GROUP |
|---|---|
| Origin | Liaoning, China |
| Model | GSL-1800X-ZF2 |
| Vacuum Base Pressure | 3.0×10⁻⁴ torr (with turbomolecular pump) |
| Maximum Evaporation Power | 1000 W (5 V / 200 A) |
| Sample Stage Diameter | Ø120 mm, Motorized Rotation |
| Evaporation Source Configuration | Dual Resistive Sources (Tungsten Boat + Tungsten Wire Basket) |
| Control Interface | 7-inch TFT Touchscreen (Graphical UI) |
| Film Thickness Resolution | 0.1 Å (standard), 0.01 Å (optional QCM upgrade) |
| Power Supply | AC 220 V, 50 Hz, 1500 W Total |
| Dimensions (W×D×H) | 440 × 240 × 260 mm |
| Weight | ~47 kg |
| Brand | KJ GROUP |
|---|---|
| Origin | Liaoning, China |
| Model | GSL-1800X-ZF2 |
| Power Supply | AC 220 V, 50 Hz |
| Maximum Operating Temperature | 1800 °C (via tungsten or molybdenum boat) |
| Base Pressure | ≤5 × 10⁻⁴ Pa (with optional turbomolecular pump) |
| Chamber Diameter | Ø300 mm |
| Chamber Height | 360 mm |
| Substrate Holder | Ø50 mm, rotary and optional heated (up to 500 °C) |
| Evaporation Sources | Dual resistive-heating boats (W/Mo) + optional e-beam crucible |
| Vacuum Interface | KF25 flanges |
| Compliance | CE certified |
| Dimensions (W×D×H) | 360 mm × 350 mm × 360 mm |
| Weight | 50 kg |
| Brand | KJ GROUP |
|---|---|
| Origin | Liaoning, China |
| Manufacturer Type | Authorized Distributor |
| Country of Origin | China |
| Model | GSL-1800X-ZF4 |
| Vacuum Chamber | Ø300 mm × 400 mm (stainless steel, electropolished interior) |
| Base Pressure | ≤8.0×10⁻⁵ Pa |
| Ultimate Vacuum | ≤8.0×10⁻⁴ Pa |
| Leak Rate | ≤6.7×10⁻⁸ Pa·L/s |
| Evaporation Sources | 4 independent tungsten heating boats |
| Substrate Heater | 0–500 °C, PID-controlled |
| Film Thickness Resolution (Al) | 0.1 Å |
| Cooling Water Flow | 15 L/min |
| Power Input | AC 220 V, 50/60 Hz, <2.16 kW (excl. pumps) |
| Evaporation Output | 0–8 V AC, up to 200 A, max. 1.6 kW |
| Substrate Stage Diameter | Ø120 mm |
| Source-to-Substrate Distance | 140–200 mm |
| Dimensions (W×D×H) | 900×1100×1800 mm |
| Weight | 230 kg |
| Brand | KJ GROUP |
|---|---|
| Origin | Liaoning, China |
| Manufacturer Type | Authorized Distributor |
| Country of Origin | China |
| Model | GSL-1800X-ZF4 |
| Vacuum Chamber | Ø300 mm × 400 mm (stainless steel, electropolished interior) |
| Base Pressure | ≤8.0×10⁻⁵ Pa |
| Ultimate Vacuum | ≤8.0×10⁻⁴ Pa |
| Leak Rate | ≤6.7×10⁻⁸ Pa·L/s |
| Evaporation Source | 4 independent tungsten boat heaters |
| Max Evaporation Current | 200 A |
| Evaporation Voltage Range | AC 0–8 V (continuously adjustable) |
| Sample Stage | Ø120 mm, top-mounted, heated (RT–500 °C, PID-controlled) |
| Substrate-to-Source Distance | 140–200 mm |
| Film Thickness Resolution (Al) | 0.1 Å |
| Cooling Water Flow | 15 L/min |
| Power Input | AC 220 V, 50/60 Hz, <2.16 kW (excl. pumps) |
| Dimensions (W×D×H) | 900 × 1100 × 1800 mm |
| Weight | 230 kg |
| Brand | KJ GROUP |
|---|---|
| Origin | Liaoning, China |
| Manufacturer Type | Authorized Distributor |
| Country of Origin | China |
| Model | GSL-1800X-ZF4 |
| Vacuum Chamber | Ø300 mm × 400 mm (stainless steel, electropolished interior) |
| Base Pressure | ≤8.0×10⁻⁵ Pa |
| Ultimate Vacuum | ≤8.0×10⁻⁴ Pa |
| Leak Rate | ≤6.7×10⁻⁸ Pa·L/s |
| Evaporation Sources | 4 independent tungsten boat heaters (water-cooled base with 5 water-cooled electrodes) |
| Substrate Heater | Temperature-controlled, RT–500 °C |
| Film Thickness Resolution (Al) | 0.1 Å |
| Substrate-to-Source Distance | 140–200 mm |
| Viewing Port | Ø100 mm fused quartz window with metal-sealed O-ring |
| Pumping System | 600 L/s turbo-molecular pump + KF40 bypass valve + CF150 gate valve |
| Electrical Input | AC 220 V, 50/60 Hz, <2.16 kW (excl. pumps) |
| Evaporation Power Supply | 0–8 V AC, up to 200 A, max 1.6 kW |
| Cooling Water Flow | 15 L/min (deionized or purified water) |
| Dimensions (W×D×H) | 900×1100×1800 mm |
| Weight | 230 kg |
| Brand | KJ GROUP |
|---|---|
| Origin | Liaoning, China |
| Manufacturer Type | Authorized Distributor |
| Country of Origin | China |
| Model | KJ-Perovskite |
| Price Range | USD $42,000 – $70,000 |
| Chamber Material | 304 Stainless Steel |
| Chamber Dimensions (W×D×H) | 600 mm × 450 mm × 450 mm |
| Vacuum System | Turbo-molecular Pump + Rotary Vane Mechanical Pump |
| Base Pressure | ≤6 × 10⁻⁴ Pa |
| System Leak Rate | ≤1 × 10⁻⁷ Pa·L/s |
| Organic Sources | 4 × 5 mL crucibles, dual 0.5 kW temperature-controlled e-beam/ resistive sources (max 400 °C, with thermocouple feedback) |
| Inorganic Sources | 4 × 5 mL crucibles, dual high-current resistive sources (300 A, 3.2 kW) |
| Source Shutter | Pneumatically actuated magnetic latching shutter |
| Substrate Holder | Top-mounted, accommodates Ø120 mm wafers or standard microscope slides |
| Substrate Rotation | 0–30 rpm, motorized and programmable |
| Substrate Heating | RT–180 °C, PID-controlled with integrated thermocouple |
| Thickness Monitoring | Dual-channel quartz crystal microbalance (QCM), resolution 0.1 Å, range 0–999,999 Å |
| Safety Interlocks | Coolant flow monitoring, power loss detection, emergency stop circuitry, misoperation prevention logic |
| Brand | KJ GROUP |
|---|---|
| Origin | Liaoning, China |
| Manufacturer Type | Authorized Distributor |
| Country of Origin | China |
| Model | KJ-Perovskite Thermal Evaporation Coater |
| Pricing | Available Upon Request |
| Chamber Material | Stainless Steel (304) |
| Chamber Dimensions | 600 mm × 450 mm × 450 mm (W×D×H) |
| Vacuum System | Turbo-molecular Pump + Rotary Vane Mechanical Pump |
| Base Pressure | ≤6×10⁻⁴ Pa |
| System Leak Rate | ≤1×10⁻⁷ Pa·L/s |
| Organic Sources | 4 × 5 mL crucibles, dual 0.5 kW temperature-controlled evaporation power supplies (max 400 °C, thermocouple feedback) |
| Inorganic Sources | 4 × 5 mL water-cooled crucibles, dual 3.2 kW high-current power supplies (max 300 A) |
| Source Shutter | Electromagnetic actuation, synchronized with deposition timing |
| Substrate Holder | Top-mounted, accommodates Ø120 mm wafers or microscope slides, rotation speed 0–30 rpm |
| Substrate Heating | Resistive heating with PID control, RT to 180 °C (±1 °C stability) |
| Thickness Monitoring | Quartz Crystal Microbalance (QCM), resolution 0.1 Å, range 0–999999 Å |
| Safety Interlocks | Coolant flow monitoring, overtemperature cutoff, emergency power disconnect, misoperation prevention logic |