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| Brand | AMETEK Princeton Applied Research |
|---|---|
| Origin | USA |
| Model | 4200A-SCS |
| DC I-V Range | 10 aA – 1 A, 0.2 µV – 210 V |
| C-V Frequency Range | 1 kHz – 10 MHz, ±30 V DC Bias |
| Pulsed I-V | ±40 V (80 V p-p), ±800 mA, 200 MSa/s, 5 ns Resolution |
| Compliance | ASTM F2679, ISO/IEC 17025, FDA 21 CFR Part 11 (with optional audit trail module) |
| Brand | JEOL (Japan Electron Optics Laboratory) |
|---|---|
| Origin | Japan |
| Model | JXA-iHP100 |
| Acceleration Voltage | 0–30 kV (0.1 kV step) |
| Beam Current Range | 10⁻¹² – 10⁻⁵ A |
| Beam Current Stability | ±5% / h, ±0.3% / 12 h (W) |
| Secondary Electron Resolution | 6 nm (W), 5 nm (LaB₆) at WD = 11 mm, 30 kV |
| Scan Magnification | ×40 – ×300,000 (WD = 11 mm) |
| Max. Image Resolution | 5,120 × 3,840 pixels |
| Display | Dual LCDs (1,280 × 1,024 each) for EPMA and SEM/EDS operation |
| Optical Microscope Resolution | ~1 µm |
| Depth of Field | ~1 µm |
| Vacuum System | Mechanical pump + turbomolecular pump + ion pump |
| Chamber Vacuum | <8.0 × 10⁻⁴ Pa |
| Gun Vacuum | <9.0 × 10⁻⁵ Pa |
| Elemental Detection Range | WDS: Be (optional) to U |
| EDS | B to U |
| WDS Wavelength Range | 0.087–9.3 nm |
| EDS Energy Range | 0–20 keV |
| WDS Spectrometer Channels | 1–5 (configurable) |
| EDS Detector | One SDD (Silicon Drift Detector), fanless option available |
| Max. Sample Size | 100 mm × 100 mm × 50 mm (H) |
| Brand | SENTECH |
|---|---|
| Origin | Germany |
| Manufacturer Type | Authorized Distributor |
| Product Origin | Imported |
| Model | SpectraRay/4 |
| Spectral Range | Configurable per instrument integration (e.g., 190–1700 nm) |
| Spot Size | Instrument-dependent (typically 10–100 µm) |
| Incidence Angle | Adjustable (40°–90°, motorized goniometer support) |
| Measurement Speed | Up to 100 ms per spectrum (full spectral acquisition) |
| Single-Measurement Time | < 5 s (typical auto-alignment + acquisition + fit) |
| Sample Size Compatibility | Up to Ø300 mm wafers or custom substrates |
| Spectral Resolution | ≤ 1 nm (dependent on spectrometer configuration) |
| Thickness Measurement Accuracy | Sub-nanometer for single-layer SiO₂ on Si (calibration traceable to NIST standards) |
| Repeatability | ≤ ±0.05 nm (1σ, over 24 h, controlled environment) |
| Direct Reflectance Accuracy | ±0.2% absolute reflectance (NIST-traceable calibration source) |
| Brand | LaVision GmbH |
|---|---|
| Country of Origin | Germany |
| Model | TriM Scope |
| Scan Mode Flexibility | Single-beam to multi-beam configurable scanning |
| Software Control | ImSpector Pro with millisecond-scale region switching |
| Detection Channels | Up to 8 non-descanned detectors (NDDs) |
| Detector Options | Cooled Generation III GaAsP PMTs or APDs |
| Quantum Efficiency Gain | Up to 40% higher than standard PMTs |
| OPO Compatibility | Full integration support for optical parametric oscillator excitation sources |
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