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| Brand | iplas |
|---|---|
| Origin | Germany |
| Model | CYRANNUS® |
| Operating Pressure Range | 10 mbar to atmospheric pressure |
| Plasma Generation Method | External multi-electrode microwave excitation (2.45 GHz or 915 MHz) |
| Substrate Compatibility | Up to 300 mm diameter planar or curved substrates |
| Compatible Precursor Gases | CH₄/H₂/O₂/Ar/He/N₂ (inert and reactive) |
| Deposited Materials | Single-crystal diamond, polycrystalline diamond, nanocrystalline diamond, DLC, Al₂O₃, c-BN |
| Plasma Stability | High reproducibility under dynamic gas flow, pressure, and voltage fluctuations |
| Safety Compliance | Fully shielded microwave cavity |
| Brand | Moorefield |
|---|---|
| Origin | United Kingdom |
| Heating Method | Cold-Wall Design |
| Base Pressure | 5×10⁻⁷ mbar |
| Substrate Dimensions | 20 × 40 mm² |
| Maximum Temperature | 1100 °C |
| Growth Time | <30 min |
| Process Gases | Ar, H₂, CH₄ |
| Mass Flow Controllers (MFCs) | Integrated for Precise Gas Delivery |
| Plasma Option | Optional RF Source (150 W, 13.56 MHz) for oCVD-WPG Variant |
| Compliance | Compatible with ISO Class 5 Cleanroom Environments |
| Safety Features | Exhaust Dilution Module, Vacuum Interlock, Thermal Shutdown |
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