- All
- Favorite
- Popular
- Most rated
| Brand | Durham Magneto Optics |
|---|---|
| Origin | United Kingdom |
| Model | MicroWriter ML3 |
| Exposure Mode | Projection-Based |
| Resolution Options | 0.6 µm, 1 µm, 2 µm, 5 µm |
| Light Source | LED |
| Wavelengths | 385 nm and 405 nm |
| Maximum Exposure Area | 195 mm × 195 mm |
| Dimensions | 700 mm × 700 mm × 700 mm |
| Software Platform | Windows 10-native MicroWriter Control Suite with Clewin GDS/DXF Import |
| Alignment Microscope | Motorized Zoom (×3/×5/×10/×20), Auto-Switching |
| Overlay Accuracy | ±0.5 µm (Flagship Configuration) |
| Z-Axis Positioning Resolution | 50 nm |
| Optical Profilometry Vertical Resolution | 100 nm |
| Grayscale Lithography Support | 255-level intensity modulation |
| Stage Minimum Step Size | 50 nm |
| Auto-Focus | Real-time FocusLock™ Surface Height Mapping and Z-Compensation |
| Brand | Moorfield |
|---|---|
| Origin | United Kingdom |
| Model | nanoETCH |
| RF Power Range | <30 W (milliwatt-resolution control) |
| Base Pressure | <5×10⁻⁷ mbar |
| Sample Stage Options | 3-inch & 6-inch |
| Vacuum System | Turbomolecular pump with optional backing pump |
| Gas Delivery | Mass Flow Controller (MFC)-regulated |
| Control Interface | Integrated touchscreen HMI with programmable etch recipes |
| Data Logging | PC-compatible USB/Ethernet interface |
| Safety Compliance | CE, IEC 61000-6-4, IEC 61000-6-2 |
Show next