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| Brand | SHNTI (Shanghai NTI Instruments) |
|---|---|
| Origin | USA |
| Manufacturer Type | Authorized Distributor |
| Product Origin | Imported |
| Model | TEM-SN |
| Accelerating Voltage Compatibility | Up to 300 kV (compatible with standard TEMs operating at 70–300 kV) |
| Magnification Range | Optimized for high-resolution imaging ≥100× |
| Frame Dimensions | 3 mm × 3 mm |
| Window Aperture | 0.5 mm or 1.0 mm (square) |
| Si₃N₄ Membrane Thickness | 50 nm or 100 nm (customizable from 30–200 nm, MOQ 100 pcs) |
| Frame Thickness | 200 µm or 381 µm |
| Surface Roughness | 0.6–2 nm RMS |
| Thermal Stability | Stable up to 1000 °C in inert/vacuum environments |
| Chemical Resistance | Inert to most acids, bases, and organic solvents (except hot phosphoric acid and strong alkalis) |
| Hydrophobicity | Native hydrophobic surface |
| Cleaning Method | Compatible with O₂ plasma, Ar/O₂ glow discharge, and chemical etching (e.g., Piranha: H₂SO₄:H₂O₂ = 1:1 |
| RCA1 | H₂O:HCl:H₂O₂ = 5:3:3) |
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