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Shanghai Microwell Semiconductor Technology Co., Ltd.

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BrandAlpha Plasma
OriginGermany
ModelQ240
Plasma Source2.45 GHz microwave, 1200 W
ChamberQuartz, Ø240 mm × 460 mm (21 L), max. 200 mm wafer capacity
Dimensions (L×W×H)760 × 775 × 775 mm
Gas Control3-channel digital MKS mass flow controllers
Vacuum DoorDrawer-type with UV/microwave-shielded viewport
Human-Machine Interface10.4" touchscreen GUI, Windows CE OS
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BrandAlpha Plasma
OriginGermany
ModelAL8
Plasma Source2.45 GHz microwave, 600 W
Chamber Volume18 L (250 × 250 × 290 mm, aluminum)
External Dimensions530 × 600 × 550 mm
Gas Delivery1 standard mass flow-controlled line (MKS digital controller)
Vacuum DoorHinged with UV- and microwave-shielded viewport
Control Interface7" GUI touchscreen, Windows CE OS
OptionalDry pump system, tri-color status tower light, up to 4 gas lines, ECR-enhanced plasma source, motorized rotating stage (Ø200 mm, variable speed)
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BrandAlpha Plasma
OriginGermany
ModelQ150, Q235, Q240, Q310
TypeMicrowave-excited Capacitively Coupled Plasma (CCP) Resist Stripping System
Application DomainSemiconductor Front-End-of-Line (FEOL) & Back-End-of-Line (BEOL) Process Cleaning
ComplianceCE-marked, SEMI S2-0216 Certified, ISO 9001:2015 Manufactured
Footprint OptionsBenchtop (Q150), Semi-automated Loadlock (Q235/Q240), Full-automated Cluster Tool Integration Capable (Q310)
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BrandAlpha Plasma
OriginGermany
ModelQ235/Q240
Plasma Source2.45 GHz microwave, 600 W
Chamber MaterialQuartz
Chamber DimensionsØ235 mm × 260 mm L
Maximum Wafer Size200 mm (8")
Footprint460 mm × 590 mm × 550 mm H
Gas InletsStandard 2-channel with digital MKS mass flow controllers
Chamber DoorDrawer-type with UV- and microwave-shielded viewport
Human-Machine Interface7" resistive touchscreen GUI running Windows CE
OptionalDry pump package (with foreline trap & vibration isolation), Faraday cage, quartz boat, tri-color status beacon, up to 4 gas lines, export-grade crating and freight logistics
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BrandAlpha Plasma
OriginGermany
ModelQ235 (Q-Series)
TypeBenchtop Microwave Plasma Asher/Stripper
Application DomainSemiconductor Fabrication, MEMS Processing, R&D Cleanroom Environments
ComplianceCE-marked, ISO 14644-1 Class 5 compatible installation, ESD-safe chamber design
Power Supply230 V AC, 50/60 Hz, 16 A
Microwave Frequency2.45 GHz
Max Chamber Volume12 L
Process Gas CompatibilityO₂, CF₄, SF₆, Ar/O₂ mixtures
Vacuum SystemIntegrated dry scroll pump (base pressure < 5 × 10⁻² mbar)
RF/Plasma MonitoringReal-time forward/reflected power metering with auto-tuning impedance matching network
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BrandELIONIX INC.
OriginJapan
Manufacturer TypeAuthorized Distributor
Origin CategoryImported
ModelELS-F150
Price RangeUSD 1.6–2.7 million (FOB Japan)
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BrandAlpha Plasma
OriginGermany
ModelAL76
Plasma Source2.45 GHz microwave, 1200 W
Chamber Volume76 L (400 × 400 × 490 mm, aluminum)
External Dimensions1050 × 800 × 2020 mm (incl. signal tower)
Gas Inlets3 standard mass flow-controlled lines (MKS digital controllers)
Door TypeDual-mode hinged/drawer with UV- and microwave-shielded viewport
Control Interface10.4" resistive touchscreen, Windows CE OS
OptionalDry pump package, tri-color signal tower, up to 4 gas lines, φ350 mm motorized rotating stage, ECR enhancement module
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BrandSCIL
OriginNetherlands
ModelLabSCIL
Wafer SizeUp to 8-inch (200 mm)
Alignment Accuracy< 1 µm
Imprint TechnologyLow-Force Soft-Mold Substrate-Conformal Nanoimprint
Compatible ResistsThermal Sol-Gel, UV Sol-Gel, UV Organic
Wafer Thickness Range0.3–2.5 mm
Footprint (W×L×H)1.8 × 1.4 × 2.2 m
Resist ApplicationExternal Spin-Coater Required
ComplianceDesigned for ISO Class 5–7 cleanroom integration
SoftwareSCIL Control Suite with Audit Trail & Parameter Logging
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BrandSAMCO
OriginJapan
ModelUV-300H
Maximum Sample DiameterØ800 mm (8-inch)
Operating EnvironmentAmbient Atmospheric Pressure
Heating Stage Temperature RangeRoom Temperature to 150 °C
Safety FeaturesInterlocked Lid, Ozone Catalyst Scrubber, N₂ Purge Cycle, Thermal Fuse Protection, Emergency Stop
ComplianceDesigned for ISO Class 5–7 Cleanroom Integration
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BrandMakeway
OriginUSA
ModelMKW-280
Mask Size5 in
Wafer/Substrate Size5 in
Alignment Accuracy1 µm (Vacuum Contact), 1.5 µm (Hard Contact), 3 µm (Soft Contact), 5 µm (Proximity Mode)
UV Source350 W, 365 nm, uniformity ±3%, irradiance 30 mW/cm²
Exposure Time Range0.1–999 s
Chuck MotionManual X/Y/Z/θ with wedge compensation leveling
MicroscopyDual CCD-based system, 80×–400× standard, up to 1000× with optional lenses, working distance 50–150 mm
Display20" LCD monitor
Contact ModesVacuum contact (adjustable force), hard contact, soft contact, proximity (gap adjustable)
Power Supply220 V, single-phase, 15 A
OptionalDeep UV source, IR alignment mode, custom substrate chucks
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BrandNILT
OriginDenmark
Manufacturer TypeAuthorized Distributor
Origin CategoryImported
ModelCNI V4.0 PV
PricingUpon Request
Imprint AreaUp to Ø210 mm (8″)
Chamber Height20 mm
Thermal NIL Max Temp200 °C (optional 250 °C module)
UV-NIL Wavelength365 nm (optional 405 nm module)
Vacuum Level≤0.1 mbar
Maximum Imprint Pressure11 bar
Control InterfaceLaptop-based with dedicated software
Automation LevelFully automated process execution (manual stamp/substrate loading)
Form FactorBenchtop, modular, plug-and-play
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BrandMakeway
OriginShanghai, China
Manufacturer TypeAuthorized Distributor
Region of OriginDomestic (China)
ModelMKW-320
Price RangeUSD 21,000 – 55,000
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