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| Brand | SCIL |
|---|---|
| Origin | Netherlands |
| Model | LabSCIL |
| Wafer Size | Up to 8-inch (200 mm) |
| Alignment Accuracy | < 1 µm |
| Imprint Technology | Low-Force Soft-Mold Substrate-Conformal Nanoimprint |
| Compatible Resists | Thermal Sol-Gel, UV Sol-Gel, UV Organic |
| Wafer Thickness Range | 0.3–2.5 mm |
| Footprint (W×L×H) | 1.8 × 1.4 × 2.2 m |
| Resist Application | External Spin-Coater Required |
| Compliance | Designed for ISO Class 5–7 cleanroom integration |
| Software | SCIL Control Suite with Audit Trail & Parameter Logging |
| Brand | NILT |
|---|---|
| Origin | Denmark |
| Manufacturer Type | Authorized Distributor |
| Origin Category | Imported |
| Model | CNI V4.0 PV |
| Pricing | Upon Request |
| Imprint Area | Up to Ø210 mm (8″) |
| Chamber Height | 20 mm |
| Thermal NIL Max Temp | 200 °C (optional 250 °C module) |
| UV-NIL Wavelength | 365 nm (optional 405 nm module) |
| Vacuum Level | ≤0.1 mbar |
| Maximum Imprint Pressure | 11 bar |
| Control Interface | Laptop-based with dedicated software |
| Automation Level | Fully automated process execution (manual stamp/substrate loading) |
| Form Factor | Benchtop, modular, plug-and-play |
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