Empowering Scientific Discovery

Shanghai Microwell Semiconductor Technology Co., Ltd.

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BrandPHI
OriginJapan
ModeloTOF 3
Instrument TypeTime-of-Flight (TOF)
Primary Beam Energy30 kV
Mass Range15,000 u
Mass Resolution13,500
ConfigurationParallel Imaging MS/MS
Charge NeutralizationDual-beam (low-energy electrons + low-energy inert gas ions), self-regulating, position-resolved
Optional FeaturesDual-cluster ion source, sub-500 nm HR2 chemical imaging, DE-free acquisition mode, high beam current HR2 imaging, large angular acceptance & depth of field
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